fe-sem and sem-edx Search Results


field emission scanning electron microscopy  (Hitachi Ltd)
99
Hitachi Ltd field emission scanning electron microscopy
Field Emission Scanning Electron Microscopy, supplied by Hitachi Ltd, used in various techniques. Bioz Stars score: 99/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/fe-sem+and+sem-edx/SU8600/10__1002_slash_adfm__202106174-324-12-18
Average 99 stars, based on 1 article reviews
field emission scanning electron microscopy - by Bioz Stars, 2026-10
99/100 stars
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tm 3030 microscope  (Hitachi Ltd)
99
Hitachi Ltd tm 3030 microscope
Tm 3030 Microscope, supplied by Hitachi Ltd, used in various techniques. Bioz Stars score: 99/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/fe-sem+and+sem-edx/TM4000/pmc09299631-194-12-11
Average 99 stars, based on 1 article reviews
tm 3030 microscope - by Bioz Stars, 2026-10
99/100 stars
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fe sem su5000 microscope  (Hitachi Ltd)
99
Hitachi Ltd fe sem su5000 microscope
Fe Sem Su5000 Microscope, supplied by Hitachi Ltd, used in various techniques. Bioz Stars score: 99/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/fe-sem+and+sem-edx/SU5000/pm34099705-117-13-12
Average 99 stars, based on 1 article reviews
fe sem su5000 microscope - by Bioz Stars, 2026-10
99/100 stars
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fe sem with edx  (JEOL)
98
JEOL fe sem with edx
Fe Sem With Edx, supplied by JEOL, used in various techniques. Bioz Stars score: 98/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/fe-sem+and+sem-edx/JSM-IT800+Scanning+Electron+Microscope/pm39092647-55-11-15
Average 98 stars, based on 1 article reviews
fe sem with edx - by Bioz Stars, 2026-10
98/100 stars
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fe sem quanta 450 feg microscope  (Gatan Inc)
96
Gatan Inc fe sem quanta 450 feg microscope
Figure 1. Surface morphology of samples before the MAO process (A, B) and after the MAO process (C, D). (A) A sample after chip machining; (B) a sample after mass finishing by the vibration tumbling technology, which served as a control sample (Ctrl); (C) a sample after the MAO process (sample MA01); (D) a sample after blasting (sample MA01-blasting). Left images: FEI FE-SEM Quanta 450 <t>FEG</t> <t>microscope,</t> bar: 500 μm. Right images: AFM, Solver NEXT (Gwyddion 2.56 software, https://gwyddion.net), bars: 1.0 μm, 1.4 μm, 6.0 μm and 1.2 μm, respectively.
Fe Sem Quanta 450 Feg Microscope, supplied by Gatan Inc, used in various techniques. Bioz Stars score: 96/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/fe-sem+and+sem-edx/APEX+Software+for+EDS/pm33188241-103-1-11
Average 96 stars, based on 1 article reviews
fe sem quanta 450 feg microscope - by Bioz Stars, 2026-10
96/100 stars
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jsm 7900f schottky field emission fe sem  (JEOL)
97
JEOL jsm 7900f schottky field emission fe sem
Figure 1. Surface morphology of samples before the MAO process (A, B) and after the MAO process (C, D). (A) A sample after chip machining; (B) a sample after mass finishing by the vibration tumbling technology, which served as a control sample (Ctrl); (C) a sample after the MAO process (sample MA01); (D) a sample after blasting (sample MA01-blasting). Left images: FEI FE-SEM Quanta 450 <t>FEG</t> <t>microscope,</t> bar: 500 μm. Right images: AFM, Solver NEXT (Gwyddion 2.56 software, https://gwyddion.net), bars: 1.0 μm, 1.4 μm, 6.0 μm and 1.2 μm, respectively.
Jsm 7900f Schottky Field Emission Fe Sem, supplied by JEOL, used in various techniques. Bioz Stars score: 97/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/fe-sem+and+sem-edx/JSM-7900F+Scanning+Electron+Microscope/pmc12004361-53-17-16
Average 97 stars, based on 1 article reviews
jsm 7900f schottky field emission fe sem - by Bioz Stars, 2026-10
97/100 stars
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field emission scanning electron microscope  (JEOL)
96
JEOL field emission scanning electron microscope
Figure 1. Surface morphology of samples before the MAO process (A, B) and after the MAO process (C, D). (A) A sample after chip machining; (B) a sample after mass finishing by the vibration tumbling technology, which served as a control sample (Ctrl); (C) a sample after the MAO process (sample MA01); (D) a sample after blasting (sample MA01-blasting). Left images: FEI FE-SEM Quanta 450 <t>FEG</t> <t>microscope,</t> bar: 500 μm. Right images: AFM, Solver NEXT (Gwyddion 2.56 software, https://gwyddion.net), bars: 1.0 μm, 1.4 μm, 6.0 μm and 1.2 μm, respectively.
Field Emission Scanning Electron Microscope, supplied by JEOL, used in various techniques. Bioz Stars score: 96/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/fe-sem+and+sem-edx/JSM-F100+Scanning+Electron+Microscope/pm36770007-73-15-21
Average 96 stars, based on 1 article reviews
field emission scanning electron microscope - by Bioz Stars, 2026-10
96/100 stars
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field emission scanning electron microscopy fesem  (JEOL)
98
JEOL field emission scanning electron microscopy fesem
Figure 1. Surface morphology of samples before the MAO process (A, B) and after the MAO process (C, D). (A) A sample after chip machining; (B) a sample after mass finishing by the vibration tumbling technology, which served as a control sample (Ctrl); (C) a sample after the MAO process (sample MA01); (D) a sample after blasting (sample MA01-blasting). Left images: FEI FE-SEM Quanta 450 <t>FEG</t> <t>microscope,</t> bar: 500 μm. Right images: AFM, Solver NEXT (Gwyddion 2.56 software, https://gwyddion.net), bars: 1.0 μm, 1.4 μm, 6.0 μm and 1.2 μm, respectively.
Field Emission Scanning Electron Microscopy Fesem, supplied by JEOL, used in various techniques. Bioz Stars score: 98/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/fe-sem+and+sem-edx/JSM-7600F+Scanning+Electron+Microscope/pm34960870-97-10-17
Average 98 stars, based on 1 article reviews
field emission scanning electron microscopy fesem - by Bioz Stars, 2026-10
98/100 stars
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fe sem edx  (JEOL)
96
JEOL fe sem edx
Figure 1. Surface morphology of samples before the MAO process (A, B) and after the MAO process (C, D). (A) A sample after chip machining; (B) a sample after mass finishing by the vibration tumbling technology, which served as a control sample (Ctrl); (C) a sample after the MAO process (sample MA01); (D) a sample after blasting (sample MA01-blasting). Left images: FEI FE-SEM Quanta 450 <t>FEG</t> <t>microscope,</t> bar: 500 μm. Right images: AFM, Solver NEXT (Gwyddion 2.56 software, https://gwyddion.net), bars: 1.0 μm, 1.4 μm, 6.0 μm and 1.2 μm, respectively.
Fe Sem Edx, supplied by JEOL, used in various techniques. Bioz Stars score: 96/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/fe-sem+and+sem-edx/JSM-7401F+Scanning+Electron+Microscope/10__3390_slash_catal10101112-93-0-2
Average 96 stars, based on 1 article reviews
fe sem edx - by Bioz Stars, 2026-10
96/100 stars
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mm2 annular bruker flatquad detector  (Bruker Corporation)
97
Bruker Corporation mm2 annular bruker flatquad detector
Figure 1. Surface morphology of samples before the MAO process (A, B) and after the MAO process (C, D). (A) A sample after chip machining; (B) a sample after mass finishing by the vibration tumbling technology, which served as a control sample (Ctrl); (C) a sample after the MAO process (sample MA01); (D) a sample after blasting (sample MA01-blasting). Left images: FEI FE-SEM Quanta 450 <t>FEG</t> <t>microscope,</t> bar: 500 μm. Right images: AFM, Solver NEXT (Gwyddion 2.56 software, https://gwyddion.net), bars: 1.0 μm, 1.4 μm, 6.0 μm and 1.2 μm, respectively.
Mm2 Annular Bruker Flatquad Detector, supplied by Bruker Corporation, used in various techniques. Bioz Stars score: 97/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/fe-sem+and+sem-edx/MM2/pmc10789741-149-48-50
Average 97 stars, based on 1 article reviews
mm2 annular bruker flatquad detector - by Bioz Stars, 2026-10
97/100 stars
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jcm-7000 scanning electron microscope  (JEOL)
96
JEOL jcm-7000 scanning electron microscope
Figure 1. Surface morphology of samples before the MAO process (A, B) and after the MAO process (C, D). (A) A sample after chip machining; (B) a sample after mass finishing by the vibration tumbling technology, which served as a control sample (Ctrl); (C) a sample after the MAO process (sample MA01); (D) a sample after blasting (sample MA01-blasting). Left images: FEI FE-SEM Quanta 450 <t>FEG</t> <t>microscope,</t> bar: 500 μm. Right images: AFM, Solver NEXT (Gwyddion 2.56 software, https://gwyddion.net), bars: 1.0 μm, 1.4 μm, 6.0 μm and 1.2 μm, respectively.
Jcm 7000 Scanning Electron Microscope, supplied by JEOL, used in various techniques. Bioz Stars score: 96/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/fe-sem+and+sem-edx/JCM-7000+Scanning+Electron+Microscope/custom%40jcm-7000%4041086181
Average 96 stars, based on 1 article reviews
jcm-7000 scanning electron microscope - by Bioz Stars, 2026-10
96/100 stars
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jsm-7500f scanning electron microscope  (JEOL)
97
JEOL jsm-7500f scanning electron microscope
Figure 1. Surface morphology of samples before the MAO process (A, B) and after the MAO process (C, D). (A) A sample after chip machining; (B) a sample after mass finishing by the vibration tumbling technology, which served as a control sample (Ctrl); (C) a sample after the MAO process (sample MA01); (D) a sample after blasting (sample MA01-blasting). Left images: FEI FE-SEM Quanta 450 <t>FEG</t> <t>microscope,</t> bar: 500 μm. Right images: AFM, Solver NEXT (Gwyddion 2.56 software, https://gwyddion.net), bars: 1.0 μm, 1.4 μm, 6.0 μm and 1.2 μm, respectively.
Jsm 7500f Scanning Electron Microscope, supplied by JEOL, used in various techniques. Bioz Stars score: 97/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/fe-sem+and+sem-edx/JSM-7500F+Scanning+Electron+Microscope/custom%40jsm-7500f%4010%2E1016%2Fj%2Enxmate%2E2025%2E100879
Average 97 stars, based on 1 article reviews
jsm-7500f scanning electron microscope - by Bioz Stars, 2026-10
97/100 stars
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Image Search Results


Figure 1. Surface morphology of samples before the MAO process (A, B) and after the MAO process (C, D). (A) A sample after chip machining; (B) a sample after mass finishing by the vibration tumbling technology, which served as a control sample (Ctrl); (C) a sample after the MAO process (sample MA01); (D) a sample after blasting (sample MA01-blasting). Left images: FEI FE-SEM Quanta 450 FEG microscope, bar: 500 μm. Right images: AFM, Solver NEXT (Gwyddion 2.56 software, https://gwyddion.net), bars: 1.0 μm, 1.4 μm, 6.0 μm and 1.2 μm, respectively.

Journal: Scientific reports

Article Title: Preparation of highly wettable coatings on Ti-6Al-4V ELI alloy for traumatological implants using micro-arc oxidation in an alkaline electrolyte.

doi: 10.1038/s41598-020-76448-w

Figure Lengend Snippet: Figure 1. Surface morphology of samples before the MAO process (A, B) and after the MAO process (C, D). (A) A sample after chip machining; (B) a sample after mass finishing by the vibration tumbling technology, which served as a control sample (Ctrl); (C) a sample after the MAO process (sample MA01); (D) a sample after blasting (sample MA01-blasting). Left images: FEI FE-SEM Quanta 450 FEG microscope, bar: 500 μm. Right images: AFM, Solver NEXT (Gwyddion 2.56 software, https://gwyddion.net), bars: 1.0 μm, 1.4 μm, 6.0 μm and 1.2 μm, respectively.

Article Snippet: FEI FE-SEM Quanta 450 FEG microscope (APEX Software for EDX 2.0, www.edax.com), bar: 10 μm.

Techniques: Control, Microscopy, Software

Figure 2. (A) Cross sections of the layer coating produced after the MAO process (sample MA01; magnification 5000 ×). The cross mark indicates the representative location for a chemical analysis of the outer layer (red label) and the inner layer (blue label). (B) Cross section depicting the layer thickness after the MAO process and blasting (sample MA01-blasting). FEI FE-SEM Quanta 450 FEG microscope (APEX Software for EDX 2.0, www.edax.com), bar: 10 μm.

Journal: Scientific reports

Article Title: Preparation of highly wettable coatings on Ti-6Al-4V ELI alloy for traumatological implants using micro-arc oxidation in an alkaline electrolyte.

doi: 10.1038/s41598-020-76448-w

Figure Lengend Snippet: Figure 2. (A) Cross sections of the layer coating produced after the MAO process (sample MA01; magnification 5000 ×). The cross mark indicates the representative location for a chemical analysis of the outer layer (red label) and the inner layer (blue label). (B) Cross section depicting the layer thickness after the MAO process and blasting (sample MA01-blasting). FEI FE-SEM Quanta 450 FEG microscope (APEX Software for EDX 2.0, www.edax.com), bar: 10 μm.

Article Snippet: FEI FE-SEM Quanta 450 FEG microscope (APEX Software for EDX 2.0, www.edax.com), bar: 10 μm.

Techniques: Produced, Microscopy, Software